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Hastelloy cavity is a vacuum cavity made of Hastelloy material, which was developed to reduce the number of vacuum chambers in semiconductor applications, and the wafer capacity is almost unchanged. This structure uses a moving vacuum with a preset air bearing equipped with a differential pressure vacuum groove. The characteristics of the product include improved static and dynamic response of machine positioning, shortened pumping time and stable time, etc.
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Record number: Su ICP No. 19021329